Название публикации ;Описание;Авторы и правообладатель
Описание Полисилазана ССЫЛКА link=http://en.wikipedia.org/wiki/Polysilazane;В обзорной статье приведены основные сведения о полисилазанах. На английском языке.;Wikipedia.org
A new organosilicon adhesive based on polysiloxane and polysilazane ССЫЛКА link=http://www.researchgate.net/publication/256402633_A_new_organosilicon_adhesive_based_on_polysiloxane_and_polysilazane;A new organosilicon adhesive was prepared by combining a vinyl-containing polysilazane (PSN) and a multifunctional polysiloxane (PSO). The adhesive was characterized by Fourier transform infrared spectroscopy. The effect of the PSN con- tent on thermal properties of the adhesive was investigated by differential scanning calorimetry and thermal gravimetric anal- ysis. On the basis of lap shear strength (LSS) test, the effects of the PSN content and the curing conditions on adhesive properties were evaluated. The sample with 20% of PSN cured at 170 C/4 h and then 330 C/4 h showed an LSS as high as 15.32 MPa at room temperature and 1.93 MPa at 400 C. The LSS decreased with the increase in testing temperature.;Wei Liu, Yongming Luo and Caihong Xu «High Performance Polymers 2013» 25: 543 originally published online 30 January 2013
A polysilazane coating protecting polyimide from atomic oxygen and vacuum ultraviolet radiation erosion ССЫЛКА link=http://www.synl.ac.cn/upPdf/No.24%20polysilazane%20coating%20Surf%20&%20coating%20Tech.pdf;Полисилазан покрытие получали на полиимидной подложки с помощью метода полимерного предшественника, чтобы защитить космические материалы из атаки атомарного кислорода (AO) и вакуумного ультрафиолетового излучения (ВУФ) на низкой околоземной орбите (LEO) среда. Кинетика эрозии, поверхностные морфологии и расследование состав поверхности указывают что это полисилазан покрытие обладает отличной стойкостью AO, и отображает низкую тенденцию к усадке в АО воздействие. Выход эрозия подготовленную полисилазана покрытия составляет 3,5 ? 2,1 ? и 10-26 см3 / Атом во АО. Экспозиция и одновременное АО и экспозиции ВУФ, соответственно. Низкий АО эрозия выход полисилазана.Результаты покрытий из формирования SiO2-богатой слоя на его верхней поверхности во время экспозиции, и ВУФ излучение может создавать радикальные сайты бесплатную информацию по открытой поверхности, способствуя образованию однородной SiO2 богатых поверхностный слой.;Longfei Hu a,b , Meishuan Li a, ?, Caihong Xu c , Yongming Luo c , Yanchun Zhou Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, China b Graduate School of Chinese Academy of Sciences, Beijing 100039,China c Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, China
A polysilazane precursor for Si-C-N-O matrix Composites ССЫЛКА link=http://ww38.indabook.org/d/polysilazanes.pdf;This paper reports the ability to use a commercial polysilazane PYROFINE PV from Elf Atochem. Centre de Recherche Rh?ne-Alpes, rue Henri Moissan, 69310 Pierre-B?nite, France. as matrix precursor for the manufacture of ceramic matrix composites.By pyrolysis under nitrogen in the temperature range 1000–1400 °C this polysilazane leads to an amorphous silicon carbonitride with a ceramic yield around 65 wt%.The rheological behaviour and the thermal decomposition of the polysilazane have been studied. Parameters for the impregnation and pyrolysis cycles required by the manufacture of composites are also proposed.;M. F. Gonon, S. Hampshire, J. P. Dissod & G. Fantozzic «JOURNAL OF THE EUROPEAN CERAMIC SOCIETY»
An NMR study of the step by step pyrolysis of a polysilazane precursor of silicon nitride ССЫЛКА link=http://;-;Nancy Brodie, Jean Pierre Majoral, Jean Pierre Disson Merck Group (KiON Defense Technologies)
AZ® Photoresists Introduction to our Product Range ССЫЛКА link=http://www.microchemicals.com/micro/introduction.pdf;COATING PROPERTIES All available AZ® PHOTORESISTS contain an additive to obtain a striation-free coating quality. Coating uniformity on modern equipment is excellent. With exception of some high-viscosity products ( >2 µm film thickness) all resists are filtered through an absolute filter of ? 0.1 µm pore size assuring a low coating defect level. This low defect level is maintained over the whole life span of the product. This has been proven by monitoring the filtration constant n/n0 over long periods of time also at elevated temperatures. Recently we introduced „optical particle counting“ in liquid photoresist and counts (cumulative) per ml for ?0.5 resp. ?0.3 µm particles are specified.;Merck Group (AZ electronic materials, Clariant)
Bulk Ceramic Composites Derived from a Preceramic Polysilazane with Alumina and Zirconia Fillers ССЫЛКА link=http://advanced.onlinelibrary.wiley.com/doi/abs/10.1002/adem.201200134;Bulk composites for the production of green-machinable, complex-shaped ceramic parts with tailorable properties for applications under mechanical stress are fabricated by a novel combination of a poly(vinyl)silazane-derived ceramic matrix with Al2O3 or ZrO2 fillers.;Thomas Konegger, Antje Liersch, Christian Gierl and Michael Scheffler
Highly porous macro- and micro-cellular ceramics from a polysilazane precursor ССЫЛКА link=http://;Micro- and macro-cellular SiCN and SiOCN foams were produced via two different routes by using a polysilazane preceramic polymer. In the first route, a mixture of partially cross-linked polysilazane and poly(methylmetacrylate) microspheres, used as sacrificial fillers, was warm pressed and subsequently pyrolyzed to create micro-cellular foams.;C. Vakifahmetoglu, I. Menapace, A. Hirsch, L. Biasetto, R. Hauser, R. Riedel, P. Colombo A-Universita` di Padova, Dipartimento di Ingegneria Meccanica, Technische Universita?t Darmstadt, Department of Materials Science and Engineering, The Pennsylvania State University.
Fabrication Process for Ultra High Aspect Ratio Polysilazane-Derived MEMS ССЫЛКА link=http://www-eng.lbl.gov/~dw/if/ideas/mems/mems_2002_papers/044.pdf; We present a new process for fabricating polysilazanederived MEMS components with ultra high aspect ratios. The width-to-height ratio of actual structures fabricated at this time is (~20:1), but shows promising results to achieve aspect ratios of 50:1. Polysilazane-derived materials are a group of polymers and ceramics that can be functionalized to have a wide range of material properties such as electronic, magnetic, dielectric, and optical.;Tsali Cross, Li-Anne Liew, Victor M. Bright, Martin L. Dunn, John W. Daily, and Rishi Raj Department of Mechanical Engineering, ECME 150, Campus Box 427, University of Colorado at Boulder Boulder, CO, USA
Improved Electrochemical Capacity of Precursor-Derived Si(B)CN-Carbon Nanotube Composite as Li-Ion Battery Anode ССЫЛКА link=http://;We study the electrochemical behavior of precursor-derived siliconboron carbonitride (Si(B)CN) ceramic and Si(B)CN coated-multiwalled carbon nanotube (CNT) composite as a lithium-ion battery anode.;R. Bhandavat and G. Singh Copyright © 2012 American Chemical Society
In-situ carbon content adjustment in polysilazane derived amorphous SiCN bulk ceramics ССЫЛКА link=http://tubiblio.ulb.tu-darmstadt.de/191/;The present paper is concerned with the in-situ carbon content adjustment in amorphous bulk silicon carbonitride (SiCN) ceramic matrices prepared by the polymer to ceramic transformation of cross-linked and compacted poly (hydridomethyl) silazane powders.;Galusek, Dusan and Reschke, Stefan and Riedel, Ralf and Dre?ler, Wolfgang and Sajgalik, Pavol and Lences, Zoltan and Majling, Jan «Journal of the European Ceramic Society».
INNOVATIVE POLYSILAZANE LIQUID COATING RESINS ССЫЛКА link=http://www.merckgroup.com/de/expertise/electronics.html; INNOVATIVE POLYSILAZANE LIQUID COATING RESINS; Merck Group.
Investigation of Polysilazane-Based \hbox {SiO}_{2} Gate Insulator for Oxide Semiconductor Thin-Film Transistors ССЫЛКА link=http://https://ieeexplore.ieee.org/document/;Major Applications: Ceramic MEMS, Ceramic Matrix Composites (CMCs), Metal Matrix Composites (MMCs), Ceramic Joining, SiC/Si3N4 coatings for C/C composites and ceramic nanocomposites. Cure Conditions: Depending on the free radical initiator employed, cure from liquid to solid can be accomplished in times ranging from 1 to 90 minutes over a temperature range of 90°C to 190°C. The peroxides are typically dissolved in solvent free polymer at the 0.5 to 1.0wt% level based on the weight of polymer employed. Cure without the use of peroxide can be effected by heating to 180-200°C.; Merck Group (KiON Defense Technologies).
NEW CATALYTIC ROUTES TO POLYSILAZANE PRECURSORS TO SILICON NITRIDE AND RELATED SYSTEMS ССЫЛКА link=http://www.dtic.mil/dtic/tr/fulltext/u2/a225057.pdf;The fabrication of high strength, light weight, ceramic and metal matrix composites (CMCs and MMCs) is an important objective of the Strategic Defense Initiative (SDI) because of the significant impact these materials will have in improving the performance of space-based satellites, their propulsion systems, and the vehicles used for payload delivery. A prerequisite to the manufacture of optimal CMCs and MMCs is the fabrication of high quality, high strength ceramic fibers based on silicon nitride (Si3 N4), silicon carbide (SiC), silicon carbide nitride (SiCN), or boron nitride (BN) or carbide (B4 C).;Richard M. Laine, John F. Harrod Dept of Materials Science and Eng. and, The Polymeric Materials Laboratory The Washington Technology Center — University of Washington //// Department of Chemistry McGill University By Montreal, Canada.
New hybrid materials based on poly(ethyleneoxide)-grafted polysilazane by hydrosilylation and their anti-fouling activities ССЫЛКА link=http://www.beilstein-journals.org/bjnano/content/pdf/2190-4286-4-75.pdf;Целью данной работы была разработка новых материалов для покрытий на основе полиэтиленоксида) (ПЭО), который был привитые на полисилазан (ПСЗ) гидросилилированием. Были изучены три типа ПЭО с различными молекулярными весами (350, 750, 2000 г / моль).; Thi Dieu Hang Nguyen, Fran?ois-Xavier Perrin and Dinh Lam Nguyen Danang University of Science and Technology, University of Danang/ Beilstein J. Nanotechnol. 2013.